Course Details

Course Information
SemesterCourse Unit CodeCourse Unit TitleT+P+LCreditNumber of ECTS CreditsLast Updated Date
1ECE686SEMICONDUCTOR PROCESS AND DEVICE FABRICATION3+0+037,514.05.2025

 
Course Details
Language of Instruction English
Level of Course Unit Doctorate's Degree
Department / Program ELECTRICAL AND COMPUTER ENGINEERING
Type of Program Formal Education
Type of Course Unit Elective
Course Delivery Method Face To Face
Objectives of the Course 1. To learn basic principles of various semiconductor processes.
2. To obtain technical details of device fabrication processes.
3. To gain knowledge in relevant cutting-edge technologies.
Course Content Semiconductor basics
CMOS process flow
Crystal
Lithography
Oxidation
Dopant introduction
Thin film deposition
Etching
MEMS fabrication
Cutting-edge fabrication technologies LO3, LO4
Course Methods and Techniques
Prerequisites and co-requisities None
Course Coordinator None
Name of Lecturers Asist Prof.Dr. DOOYOUNG HAH dooyoung.hah@agu.edu.tr
Assistants None
Work Placement(s) No

Recommended or Required Reading
Resources


Planned Learning Activities and Teaching Methods
Activities are given in detail in the section of "Assessment Methods and Criteria" and "Workload Calculation"

Assessment Methods and Criteria
In-Term Studies Quantity Percentage
Yarıl yılSonu Sınavı/Dönem Projesinin Başarı Notuna Katkısı 1 % 25
Ödev 5 % 20
Proje/Çizim 1 % 20
Sunum/Seminer 2 % 10
Final examination 1 % 25
Total
10
% 100

 
ECTS Allocated Based on Student Workload
Activities Quantity Duration Total Work Load
Araştırma Ödevi 5 5 25
Yazılı Sınav 1 3 3
Ev Ödevi 5 4 20
Sınıf İçi Aktivitesi 5 1 5
Sunum için Hazırlık 2 10 20
Sunum 2 1 2
Proje 1 40 40
Okuma 10 2 20
Tekrar Anlatım 10 1 10
Araştırma 5 3 15
Simülasyon 2 10 20
Yüz Yüze Ders 14 3 42
Final Sınavı 1 3 3
Total Work Load   Number of ECTS Credits 7,5 225

 
Course Learning Outcomes: Upon the successful completion of this course, students will be able to:
NoLearning Outcomes
1 To describe the principles of semiconductor processes.
2 To design specific processes based on their mathematical models.
3 To design fabrication process flows for given devices, materials and constraints.
4 To explain specific cutting-edge technologies related to the course, with details.

 
Weekly Detailed Course Contents
WeekTopicsStudy MaterialsMaterials
1 Introduction
2 Semiconductors
3 CMOS process
4 Crystal
5 Lithography
6 Oxidation
7 Dopant introduction
8 Midterm exam
9 Thin film deposition
10 Etching
11 MEMS fabrication
12 Contemporary research
13 Contemporary research
14 Project presentation

 
Contribution of Learning Outcomes to Programme Outcomes
P1 P2 P3 P4 P5 P6 P7 P8 P9 P10 P11
C1 5 5 1 1 1 1 2 5 3 1 1
C2 5 5 1 1 1 2 5 5 3 3 1
C3 5 5 1 1 1 2 5 5 3 3 1
C4 5 5 1 5 2 3 5 5 3 3 1

  Contribution: 1: Very Slight 2:Slight 3:Moderate 4:Significant 5:Very Significant

  
  https://sis.agu.edu.tr/oibs/bologna/progCourseDetails.aspx?curCourse=77788&lang=en